Title :
Genetic algorithms for reflective filters design
Author :
Li, E. Herbert ; Djuri, A.B.
Author_Institution :
Dept. of Electr. & Electron. Eng., Hong Kong Univ., China
Abstract :
A genetic algorithm (GA) with adaptive mutations has been employed for the design of Bragg reflectors. The algorithm enables three different design types: (a) composition and thickness of each layer are optimized; (b) two compositions are chosen for the two alternating materials, and the thickness of each layer is optimized; (c) composition and thickness of two layers are chosen and the pair is repeated. The algorithm enables the finding of the optimal design for two chosen incident and final media, and it is capable of taking into account the existence of a finite optically thick substrate. The algorithm is very versatile and can be applied for the design of refractive filters using various materials. We have demonstrated application of this algorithm to the design of AlxGa1-xN reflectors, as well as organic and dielectric reflectors
Keywords :
Bragg gratings; III-V semiconductors; aluminium compounds; gallium compounds; genetic algorithms; light reflection; mirrors; optical design techniques; optical filters; reflectivity; wide band gap semiconductors; AlxGa1-xN reflectors; AlGaN; Bragg reflector design; adaptive mutations; alternating material compositions; design types; dielectric reflectors; final medium; finite optically thick substrate; genetic algorithms; incident medium; layer composition optimization; layer thickness optimization; optimal design; organic reflectors; reflective filter design; refractive filter design; Algorithm design and analysis; Composite materials; Design optimization; Dielectric materials; Dielectric substrates; Genetic algorithms; Genetic mutations; Optical design; Optical filters; Optical refraction;
Conference_Titel :
Electron Devices Meeting, 2001. Proceedings. 2001 IEEE Hong Kong
Conference_Location :
Hong Kong
Print_ISBN :
0-7803-6714-6
DOI :
10.1109/HKEDM.2001.946907
