• DocumentCode
    3434202
  • Title

    The GE high density overlay MCM interconnect method solves high power needs of GaAs system design

  • Author

    Gdula, Michael ; Yerman, Alexander ; Krishnamurthy, Vikram ; Fillion, Raymond

  • Author_Institution
    GE, Schenectady, NY, USA
  • fYear
    1993
  • fDate
    1993
  • Firstpage
    339
  • Lastpage
    345
  • Abstract
    As electronic systems signals and clock rates exceed 100 MHz, designers must consider the use of emerging high performance digital GaAs chip technology. Because GaAs parts do not yield at the high rates of more mature silicon technology devices, it is presently infeasible to build monolithic wafer scale integration (WSI) with GaAs technology. A hybrid wafer scale integration (HWSI) approach has been developed to overcome the limits of monolithic approaches, including the ability to provide for multichip module (MCM) process optimizations serving low IR loss requirements for power delivery, and use of overlay interconnect, first placing the chip into a structure for the most advantageous thermal management.
  • Keywords
    VLSI; digital integrated circuits; hybrid integrated circuits; integrated circuit technology; multichip modules; thermal analysis; 100 MHz; MCM interconnect method; digital GaAs chip technology; high density overlay; hybrid WSI; low IR loss requirements; multichip module; process optimizations; thermal management; wafer scale integration; Dielectric substrates; Dielectric thin films; Gallium arsenide; Integrated circuit interconnections; Power system interconnection; Semiconductor device modeling; Silicon; Switches; Thermal conductivity; Thermal management;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Wafer Scale Integration, 1993. Proceedings., Fifth Annual IEEE International Conference on
  • Conference_Location
    San Francisco, CA, USA
  • Print_ISBN
    0-7803-0867-0
  • Type

    conf

  • DOI
    10.1109/ICWSI.1993.255244
  • Filename
    255244