DocumentCode
3434202
Title
The GE high density overlay MCM interconnect method solves high power needs of GaAs system design
Author
Gdula, Michael ; Yerman, Alexander ; Krishnamurthy, Vikram ; Fillion, Raymond
Author_Institution
GE, Schenectady, NY, USA
fYear
1993
fDate
1993
Firstpage
339
Lastpage
345
Abstract
As electronic systems signals and clock rates exceed 100 MHz, designers must consider the use of emerging high performance digital GaAs chip technology. Because GaAs parts do not yield at the high rates of more mature silicon technology devices, it is presently infeasible to build monolithic wafer scale integration (WSI) with GaAs technology. A hybrid wafer scale integration (HWSI) approach has been developed to overcome the limits of monolithic approaches, including the ability to provide for multichip module (MCM) process optimizations serving low IR loss requirements for power delivery, and use of overlay interconnect, first placing the chip into a structure for the most advantageous thermal management.
Keywords
VLSI; digital integrated circuits; hybrid integrated circuits; integrated circuit technology; multichip modules; thermal analysis; 100 MHz; MCM interconnect method; digital GaAs chip technology; high density overlay; hybrid WSI; low IR loss requirements; multichip module; process optimizations; thermal management; wafer scale integration; Dielectric substrates; Dielectric thin films; Gallium arsenide; Integrated circuit interconnections; Power system interconnection; Semiconductor device modeling; Silicon; Switches; Thermal conductivity; Thermal management;
fLanguage
English
Publisher
ieee
Conference_Titel
Wafer Scale Integration, 1993. Proceedings., Fifth Annual IEEE International Conference on
Conference_Location
San Francisco, CA, USA
Print_ISBN
0-7803-0867-0
Type
conf
DOI
10.1109/ICWSI.1993.255244
Filename
255244
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