Title :
Simulation of a lateral trench IGBT with p+ diverter having superior electrical characteristics
Author :
Kang, Ey Goo ; Moon, Seung Hyun ; Kim, Sangsig ; Sung, Man Young
Author_Institution :
Dept. of Electr. Eng., Korea Univ., Seoul, South Korea
Abstract :
A new lateral trench insulated gate bipolar transistor (LTIGBT) with p+ diverter was proposed to improve the characteristics of the conventional LTIGBT. The p+ divert layer was placed between anode electrode region and cathode electrode. Generally, if the LTIGBT had a p+ divert region, forward blocking voltage was decreased greatly because the n-drift layer corresponding to punchthrough was decreased. However, the forward blocking voltage of the proposed LTIGBT with p+ diverter was about 140 V, while that of the conventional LTIGBT of the same size was 105 V. The forward blocking voltage of LTIGBT with p+ diverter is 1.3 times greater than those of the conventional LTIGBT. Since the p+ diverter region of the proposed device was enclosed by a trench oxide layer, the electric field moved toward the trench oxide layer, and punchthrough breakdown of LTIGBT with p+ diverter occurred subsequently. Therefore, the p+ diverter of the proposed LTIGBT did not relate to breakdown voltage in the same way as a conventional LTIGBT. The latch-up current densities of the conventional LTIGBT and LTIGBT with p+ diverter were 540 A/cm2, and 1453 A/cm2, respectively. The enhanced latch-up capability of the LTIGBT with p+ diverter was obtained through holes in the current directly reaching the cathode via the p+ divert region and p+ cathode layer beneath the n+ cathode layer
Keywords :
current density; insulated gate bipolar transistors; isolation technology; power bipolar transistors; semiconductor device breakdown; semiconductor device models; 105 V; 140 V; LTIGBT; anode electrode region; breakdown voltage; cathode electrode region; electric field; electrical characteristics; enhanced latch-up capability; forward blocking voltage; hole current; latch-up current density; lateral trench IGBT; lateral trench insulated gate bipolar transistor; n+ cathode layer; n-drift layer; p+ cathode layer; p+ divert layer; p+ divert region; p+ diverter; p+ diverter region; punchthrough; punchthrough breakdown; simulation; trench oxide layer; Anodes; Cathodes; Current density; Electric breakdown; Electric variables; Electrodes; Insulated gate bipolar transistors; Moon; Numerical simulation; Voltage;
Conference_Titel :
Electron Devices Meeting, 2001. Proceedings. 2001 IEEE Hong Kong
Conference_Location :
Hong Kong
Print_ISBN :
0-7803-6714-6
DOI :
10.1109/HKEDM.2001.946916