A yield management strategy for semiconductor manufacturing based on information theory

Author

Weber, Charles ; Sankaran, Vijay ; Tobin, Kenneth W., Jr. ; Scher, Gary

Author_Institution

Sloan Sch. of Manage., MIT, Cambridge, MA, USA

fYear

1999

fDate

36373

Firstpage

533

Abstract

A model based on information theory, which allows technology managers to choose the optimal strategies for yield management in the semiconductor industry, is presented. The knowledge extraction rate per experimentation cycle and knowledge extraction rate per unit time serve as benchmarking metrics for yield learning. They enable managers to make objective comparisons of apparently unrelated technologies. Combinations of four yield analysis tools-electrical testing, automatic defect classification, spatial signature analysis and wafer position analysis-are examined in detail to determine an optimal yield management strategy for both the R&D and volume production environments

Keywords

electronic engineering computing; integrated circuit testing; integrated circuit yield; knowledge acquisition; management; R&D environment; automatic defect classification; benchmarking metrics; electrical testing; experimentation cycle; information theory; integrated circuits; knowledge extraction rate; optimal yield management strategy; semiconductor industry; semiconductor manufacturing; spatial signature analysis; technology management; technology managers; unrelated technologies objective comparisons; volume production environment; wafer position analysis; yield learning; yield management strategy; Automatic testing; Benchmark testing; Data mining; Electronics industry; Environmental management; Information theory; Integrated circuit yield; Research and development management; Semiconductor device manufacture; Technology management;

fLanguage

English

Publisher

ieee

Conference_Titel

Management of Engineering and Technology, 1999. Technology and Innovation Management. PICMET '99. Portland International Conference on

Conference_Location

Portland, OR

Print_ISBN

1-890843-02-4

Type

conf

DOI

10.1109/PICMET.1999.787852

Filename

787852