DocumentCode
3435151
Title
Degradation of GaN high-electron mobility transistors in voltage step stress
Author
Xinhua Wang ; Lei Pang ; Jianhui Wang ; Tingting Yuan ; Weijun Luo ; Xiaojuan Chen ; Xinyu Liu
Author_Institution
Key Lab. of Microelectron. Device & Integrated Technol., Inst. of Microelectron., Beijing, China
fYear
2012
fDate
14-18 Oct. 2012
Firstpage
122
Lastpage
124
Abstract
Voltage step-stress tests on GaN-on-SiC HEMT showed that electric field is a driving factor for degradation. The position of localized damage is corresponding to the high electric field region. A degradation mode different from previous reports is observed, which led to an increase of drain current after stress in certain conditions. We attribute this to the collection of the positive mobile charge under the gate during the stress.
Keywords
III-V semiconductors; gallium compounds; high electron mobility transistors; silicon compounds; stress analysis; wide band gap semiconductors; GaN; SiC; high electric field region; high-electron mobility transistor degradation; localized damage position; positive mobile charge; voltage step-stress tests; Degradation; Electric fields; Gallium nitride; HEMTs; Logic gates; Reliability; Stress;
fLanguage
English
Publisher
ieee
Conference_Titel
Integrated Reliability Workshop Final Report (IRW), 2012 IEEE International
Conference_Location
South Lake Tahoe, CA
ISSN
1930-8841
Print_ISBN
978-1-4673-2749-7
Type
conf
DOI
10.1109/IIRW.2012.6468935
Filename
6468935
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