• DocumentCode
    3435151
  • Title

    Degradation of GaN high-electron mobility transistors in voltage step stress

  • Author

    Xinhua Wang ; Lei Pang ; Jianhui Wang ; Tingting Yuan ; Weijun Luo ; Xiaojuan Chen ; Xinyu Liu

  • Author_Institution
    Key Lab. of Microelectron. Device & Integrated Technol., Inst. of Microelectron., Beijing, China
  • fYear
    2012
  • fDate
    14-18 Oct. 2012
  • Firstpage
    122
  • Lastpage
    124
  • Abstract
    Voltage step-stress tests on GaN-on-SiC HEMT showed that electric field is a driving factor for degradation. The position of localized damage is corresponding to the high electric field region. A degradation mode different from previous reports is observed, which led to an increase of drain current after stress in certain conditions. We attribute this to the collection of the positive mobile charge under the gate during the stress.
  • Keywords
    III-V semiconductors; gallium compounds; high electron mobility transistors; silicon compounds; stress analysis; wide band gap semiconductors; GaN; SiC; high electric field region; high-electron mobility transistor degradation; localized damage position; positive mobile charge; voltage step-stress tests; Degradation; Electric fields; Gallium nitride; HEMTs; Logic gates; Reliability; Stress;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Integrated Reliability Workshop Final Report (IRW), 2012 IEEE International
  • Conference_Location
    South Lake Tahoe, CA
  • ISSN
    1930-8841
  • Print_ISBN
    978-1-4673-2749-7
  • Type

    conf

  • DOI
    10.1109/IIRW.2012.6468935
  • Filename
    6468935