DocumentCode :
3435664
Title :
VLSI scaling trends and challenges
Author :
Rusu, Stefan
fYear :
2001
fDate :
2001
Abstract :
This article discusses trends in VLSI technology evolution. It concentrates on challenges to VLSI scaling, including transistor scaling, interconnect scaling, leakage currents and silicon-on-insulator technology. It concludes that we still have not found a fundamental barrier to extending Moore´s law and that the major challenge to scaling in the future will be power and efficiency
Keywords :
VLSI; integrated circuit technology; Moore´s law; SOI technology; VLSI technology scaling; interconnect scaling; leakage currents; transistor scaling; Very large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Circuits and Systems, 2001. Tutorial Guide: ISCAS 2001. The IEEE International Symposium on
Conference_Location :
Sydney, NSW
Print_ISBN :
0-7803-7113-5
Type :
conf
DOI :
10.1109/TUTCAS.2001.946980
Filename :
946980
Link To Document :
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