DocumentCode
3435721
Title
Reliability aspects of GaN based power devices for high voltage switching applications
Author
Wurfl, Joachim
Author_Institution
Ferdinand-Braun-Institut, Leibniz Institut fur Hochstfrequenztechnik, Gustav-Kirchhoff-StraBe 4, 12489 Berlin - Germany
fYear
2012
fDate
14-18 Oct. 2012
Firstpage
204
Lastpage
204
Abstract
Summary form only given. GaN based power devices for high efficiency switching applications in modern power electronics are rapidly moving into the focus of world wide research and development activities. Due to their unique material properties GaN power devices are distinguished by featuring high breakdown voltages, low on-state resistances and fast switching properties at the same time. Finally, these properties are the consequences of extremely high field and current densities that are possible per unit device volume or area. Therefore, in order to obtain very high performance, the material itself is stressed significantly during standard device operation and any imperfection may lead to wear out and reliability problems. Thus material quality, the specific epitaxial design as well as the device topology will directly influence device performance, reliability and mode of degradation. The tutorial will mainly discuss those degradation mechanisms that are especially due to the specific material combinations used in GaN based high voltage device technology such as epitaxial layer design, chip metallization, passivation schemes and general device topology and layout. It will then discuss technological ways towards engineering reliability into these devices.
fLanguage
English
Publisher
ieee
Conference_Titel
Integrated Reliability Workshop Final Report (IRW), 2012 IEEE International
Conference_Location
South Lake Tahoe, CA
ISSN
1930-8841
Print_ISBN
978-1-4673-2749-7
Type
conf
DOI
10.1109/IIRW.2012.6468959
Filename
6468959
Link To Document