Title :
Raman characterization of GaAs/InGaP heterostructure bipolar transistor
Author :
Amtout, A. ; Ferguson, I. ; Lee, D.S. ; Sun, S.Z. ; Armour, E.A. ; Cooke, P. ; Stall, R.A.
Author_Institution :
Emcore Corp., Somerset, NJ, USA
Abstract :
Micro-Raman spectroscopy has been used to study GaAs/InGaP Heterostructure Bipolar Transistor (HBT) structure that has been fabricated into an operational device. Carrier concentration measurements from the exposed Tellurium-doped InxGa1-x As contact emitter and silicon doped GaAs sub-collector were estimated from the position of the high frequency coupled Plasmon-Longitudinal optical Phonon (PLP) mode. The frequency of the coupled PLP mode in In0.6Ga0.4As emitter contact layer was measured as 1811 cm-1 with a corresponding carrier concentration of n=1.3×1019 cm-1. The GaAs sub-collector carrier concentration was estimated to be n=4.51018 cm-3. These carrier concentrations were in good agreement with that measured using other techniques and that expected from the growth conditions. The Raman technique was not sensitive to the hole concentration of the carbon doped GaAs base. While micro-Raman technique can be used studying the doping levels of fabricated HBT devices the inability to probe the carbon-doped base limits the usefulness of this technique for these devices
Keywords :
III-V semiconductors; Raman spectra; carrier density; gallium arsenide; heterojunction bipolar transistors; indium compounds; semiconductor heterojunctions; GaAs-InGaP; GaAs/InGaP heterostructure bipolar transistor; GaAs:Si sub-collector; InxGa1-xAs:Te contact emitter; Raman characterization; carrier concentration; high frequency coupled Plasmon-Longitudinal optical Phonon mode; Bipolar transistors; Frequency estimation; Frequency measurement; Gallium arsenide; Heterojunction bipolar transistors; Optical coupling; Position measurement; Silicon; Spectroscopy; Stimulated emission;
Conference_Titel :
Compound Semiconductors, 2000 IEEE International Symposium on
Conference_Location :
Monterey, CA
Print_ISBN :
0-7803-6258-6
DOI :
10.1109/ISCS.2000.947123