DocumentCode :
3436225
Title :
High performance Bulk FinFET with bottom spacer
Author :
Tripathi, S.L. ; Mishra, Ravishankar ; Narendra, V. ; Mishra, R.A.
Author_Institution :
Dept. of ECE, MNNIT, Allahabad, India
fYear :
2013
fDate :
17-19 Jan. 2013
Firstpage :
1
Lastpage :
5
Abstract :
In this paper we propose a novel bottom spacer Bulk FinFET structure for logic applications suitable for system-on-chip (SOC) requirements. It solves the problem associated with the width quantization effect with optimized spacer height. Using well-calibrated device models and simulations, we have shown that Bulk FinFETs can be optimized with identical performances as that of SOI FinFETs. Optimized bulk FinFETs are compared with the corresponding SOI FinFETs using 3-D device simulation and design methodology.
Keywords :
MOSFET; semiconductor device models; silicon-on-insulator; system-on-chip; 3D device simulation; SOI FinFET; SoC; bottom spacer; design methodology; high performance bulk FinFET structure; logic applications; optimized spacer height; system-on-chip; well-calibrated device models; width quantization effect; Doping profiles; FinFETs; Optimization; Performance evaluation; Quantization; Semiconductor process modeling; Bulk Fin-shaped field-effect transistor (FinFET); Sentarous TCAD device simulator; short-channel performance; spacer; width quantization;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronics, Computing and Communication Technologies (CONECCT), 2013 IEEE International Conference on
Conference_Location :
Bangalore
Print_ISBN :
978-1-4673-4609-2
Type :
conf
DOI :
10.1109/CONECCT.2013.6469282
Filename :
6469282
Link To Document :
بازگشت