DocumentCode
3436643
Title
Design and fabrication of compliant micromechanisms and structures with negative Poisson´s ratio
Author
Larsen, Ulrik Darling ; Sigmund, Ole ; Bouwstra, Siebe
Author_Institution
Mikroelektronik Centret, Tech. Univ., Lyngby, Denmark
fYear
1996
fDate
11-15 Feb 1996
Firstpage
365
Lastpage
371
Abstract
This paper describes a new way to design and fabricate compliant micromechanisms and material structures with negative Poisson´s ratio (NPR). The design of compliant mechanisms and material structures is accomplished in an automated way using a numerical topology optimization method. The procedure allows the user to specify the elastic properties of materials or the mechanical or geometrical advantages of compliant mechanisms and returns the optimal structures. The topologies obtained by the numerical procedure require practically no interaction by the engineer before they can be transferred to the fabrication unit. Fabrication is carried out by patterning a sputtered silicon on a PECVD-glass with a laser micromachining set-up. Subsequently the structures are etched into the underlying PECVD-glass and the glass are underetched, all in one two-step RIE process. The components are tested using a probe placed on an xy-stage. This fast prototyping allows newly developed topologies to be fabricated and tested within the same day
Keywords
Poisson ratio; computational geometry; elastic moduli; flexible structures; laser beam machining; least squares approximations; linear programming; microactuators; micromachining; micromechanical devices; photolithography; sputter etching; topology; PECVD-glass; Si; compliant material structures; compliant micromechanisms; design; displacement amplifier; elastic properties; fabrication; fast prototyping; force invertor; geometrical advantages; laser direct writing; laser micromachining; least squares error minimization; mechanical advantages; negative Poisson´s ratio; numerical topology optimization method; optimal structures; patterning; quadrilateral finite elements; sequential linear programming; sputtered Si; two-step RIE process; Glass; Mechanical factors; Micromachining; Optical device fabrication; Optimization methods; Probes; Silicon; Sputter etching; Testing; Topology;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems, 1996, MEMS '96, Proceedings. An Investigation of Micro Structures, Sensors, Actuators, Machines and Systems. IEEE, The Ninth Annual International Workshop on
Conference_Location
San Diego, CA
Print_ISBN
0-7803-2985-6
Type
conf
DOI
10.1109/MEMSYS.1996.494009
Filename
494009
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