DocumentCode
3436765
Title
Simulation of electron tunneling in HEMT devices
Author
Lyumkis, E. ; Mickevicius, R. ; Penzin, O. ; Polsky, B. ; El Sayed, K.
Author_Institution
Integrated Syst. Eng. Inc., San Jose, CA, USA
fYear
2000
fDate
2000
Firstpage
179
Lastpage
184
Abstract
We report results of 2D simulations of the electron tunneling through hetero-interfaces and gate Schottky contact in AlGaAs/InGaAs HEMT. For the first time the rigorous non-local tunneling models have been applied for heterostructure device simulations. The simulations have been performed within hydrodynamic transport model to account for hot electrons. The tunneling through hetero-interfaces fully controls the drain current. The tunneling through the Schottky barrier is responsible for the gate leakage and can significantly affect the transfer characteristics. Further, we have found that the breakdown characteristics of a HEMT are strongly affected by the gate leakage due to tunneling through the Schottky barrier. This effect may lead to a considerable underestimation of the HEMT breakdown voltage, when non-destructive measurement methods are applied
Keywords
III-V semiconductors; Schottky barriers; aluminium compounds; gallium arsenide; high electron mobility transistors; hot carriers; indium compounds; semiconductor device models; tunnel transistors; AlGaAs; AlGaAs/InGaAs HEMT; HEMT devices; InGaAs; drain current; electron tunneling; gate Schottky contact; gate leakage; hetero-interfaces; heterostructure device simulations; hot electrons; hydrodynamic transport model; nonlocal tunneling models; transfer characteristics; Electric breakdown; Electrons; Electrostatics; Gate leakage; HEMTs; Hydrodynamics; Modeling; Schottky barriers; Systems engineering and theory; Tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
Compound Semiconductors, 2000 IEEE International Symposium on
Conference_Location
Monterey, CA
Print_ISBN
0-7803-6258-6
Type
conf
DOI
10.1109/ISCS.2000.947150
Filename
947150
Link To Document