DocumentCode :
3436890
Title :
High-density silicon microprobe arrays for LCD pixel inspection
Author :
Lee, Changyeol ; Kim, Yoonhyuk ; Yong-Gie Choi ; Cho, Young-Ho ; Lee, Kwyro ; Kwak, Byung Man
Author_Institution :
Dept. of Electr. Eng., Korea Adv. Inst. of Sci. & Technol., Taejon, South Korea
fYear :
1996
fDate :
11-15 Feb 1996
Firstpage :
429
Lastpage :
434
Abstract :
A novel structure and fabrication methods of high-density silicon microprobes have been developed for use in the pixel-wise inspection of flat-panel screens. The microprobe array consists of 101 parallel cantilever-beam springs, fabricated by an anisotropic etching of (110) silicon wafers. Each microbeam contains a hemispheric gold probe-tip for one-to-one electrical contact with high-density flat-panel electrodes, metal lines for pixel-wise electrical signal drive, and self-diagnostic structures for beam breakage detection. The dimensions of the microprobe array have been decided to meet a series of design constraints, including geometric and strength requirements, microfabrication constraints and the admissible ranges of contact forces, obtained from preliminary experiments. An integrated fabrication process has been developed based on surface-micromachining, electroplating, and bulk-micromachining processes with an etch-rate based corner compensation technique. The fabricated microprobe array has been applied to the probing of high-density electrodes on the 640×480 STN-LCD panel, resulting in stable electrical contacts for an applied load of 2g f per microbeam
Keywords :
electronic equipment testing; electroplating; elemental semiconductors; etching; flat panel displays; gold; integrated circuit technology; liquid crystal displays; micromachining; microsensors; semiconductor technology; silicon; (110) silicon wafers; 307200 pixel; 480 pixel; 640 pixel; Au; STN LCD pixel inspection; Si; Si high-density microprobes; Si microprobe arrays; admissible ranges; anisotropic etching; beam breakage detection; cantilever-beam springs; electroplating; fabrication; flat-panel screens; hemispheric gold probe-tip; high-density flat-panel electrodes; integrated fabrication; metal lines; microbeam; microfabrication constraints; microprobe array; pixel-wise electrical signal drive; pixel-wise inspection; self-diagnostic structures; surface-micromachining; Contacts; Electrodes; Gold; Inspection; Joining processes; Liquid crystal displays; Probes; Silicon; Springs; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Micro Electro Mechanical Systems, 1996, MEMS '96, Proceedings. An Investigation of Micro Structures, Sensors, Actuators, Machines and Systems. IEEE, The Ninth Annual International Workshop on
Conference_Location :
San Diego, CA
Print_ISBN :
0-7803-2985-6
Type :
conf
DOI :
10.1109/MEMSYS.1996.494020
Filename :
494020
Link To Document :
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