• DocumentCode
    3437139
  • Title

    Neutron-induced latchup in SRAMs at ground level

  • Author

    Dodd, Paul E. ; Shaneyfelt, Marty R. ; Schwank, James R. ; Hash, Gerald L.

  • Author_Institution
    Sandia Nat. Lab., Albuquerque, NM, USA
  • fYear
    2003
  • fDate
    30 March-4 April 2003
  • Firstpage
    51
  • Lastpage
    55
  • Abstract
    Neutron-induced single-event latchup has been studied in SRAMs manufactured by several different vendors. These SRAMs span different cell designs (six-transistor and four-transistor cells), technology generations (0.25 μm to 0.14 μm) and power supplies (5 V to 1.5 V). While some technologies appear to be latchup-free in neutron environments, others have neutron-induced latchup failure-in-time (FIT) rates as high as 300 FIT/Mbit at room temperature and maximum rated voltage. Latchup FIT rates increase dramatically with temperature. The observed latchup rates can lead to very high failure rates in systems with large amounts of memory, and cannot be circumvented using error correction.
  • Keywords
    CMOS memory circuits; SRAM chips; failure analysis; integrated circuit reliability; integrated circuit testing; neutron effects; 0.25 to 0.14 micron; 5 to 1.5 V; CMOS SRAMs; SER; error correction; four-transistor cells; ground level; hard errors; maximum rated voltage; neutron-induced latchup failure-in-time rates; neutron-induced single-event latchup; power supplies; room temperature; single-event latchup; single-event upset; six-transistor cells; soft errors; technology generations; terrestrial cosmic rays; Cosmic rays; Error correction; Laboratories; Neutrons; Power generation; Power supplies; Random access memory; Silicon on insulator technology; Temperature; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium Proceedings, 2003. 41st Annual. 2003 IEEE International
  • Print_ISBN
    0-7803-7649-8
  • Type

    conf

  • DOI
    10.1109/RELPHY.2003.1197720
  • Filename
    1197720