DocumentCode :
3437139
Title :
Neutron-induced latchup in SRAMs at ground level
Author :
Dodd, Paul E. ; Shaneyfelt, Marty R. ; Schwank, James R. ; Hash, Gerald L.
Author_Institution :
Sandia Nat. Lab., Albuquerque, NM, USA
fYear :
2003
fDate :
30 March-4 April 2003
Firstpage :
51
Lastpage :
55
Abstract :
Neutron-induced single-event latchup has been studied in SRAMs manufactured by several different vendors. These SRAMs span different cell designs (six-transistor and four-transistor cells), technology generations (0.25 μm to 0.14 μm) and power supplies (5 V to 1.5 V). While some technologies appear to be latchup-free in neutron environments, others have neutron-induced latchup failure-in-time (FIT) rates as high as 300 FIT/Mbit at room temperature and maximum rated voltage. Latchup FIT rates increase dramatically with temperature. The observed latchup rates can lead to very high failure rates in systems with large amounts of memory, and cannot be circumvented using error correction.
Keywords :
CMOS memory circuits; SRAM chips; failure analysis; integrated circuit reliability; integrated circuit testing; neutron effects; 0.25 to 0.14 micron; 5 to 1.5 V; CMOS SRAMs; SER; error correction; four-transistor cells; ground level; hard errors; maximum rated voltage; neutron-induced latchup failure-in-time rates; neutron-induced single-event latchup; power supplies; room temperature; single-event latchup; single-event upset; six-transistor cells; soft errors; technology generations; terrestrial cosmic rays; Cosmic rays; Error correction; Laboratories; Neutrons; Power generation; Power supplies; Random access memory; Silicon on insulator technology; Temperature; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium Proceedings, 2003. 41st Annual. 2003 IEEE International
Print_ISBN :
0-7803-7649-8
Type :
conf
DOI :
10.1109/RELPHY.2003.1197720
Filename :
1197720
Link To Document :
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