Title :
A study on reflection coefficient from double layered lossy dielectric by using flanged rectangular waveguide
Author :
Hirano, M. ; Takahashi, M. ; Abe, M.
Author_Institution :
Dept. of Electron. & Commun. Eng., Musashi Inst. of Technol., Tokyo, Japan
Abstract :
Knowing the permittivity and permeability of materials is often needed when we design radar absorbers or radomes. Although the resonator method and waveguide method are widely used for microwave measurement, they require one to cut a sample for fitting inner walls, is labor intensive, and it is difficult to obtain accurate measurements especially on higher frequencies because of the occurrence of errors due to the gap between the wall and the sample. In practical measurements of the reflection coefficient it is necessary to consider the error occurrence caused by insufficient contact between the flange and the measured sample. The effect of this insufficient contact is considered by regarding these contacts as an equivalent dielectric layer. We derived the reflection coefficient of the double layered dielectric structure and studied theoretically the effects of the existence of an air or dielectric gap between the flange and a lossy dielectric sheet.
Keywords :
absorbing media; dielectric-loaded waveguides; electromagnetic wave reflection; inhomogeneous media; rectangular waveguides; spectral-domain analysis; waveguide theory; PTFE sheet; air gap; dielectric gap; dielectric loaded waveguide; double layered dielectric structure; double layered lossy dielectric; equivalent dielectric layer; flanged rectangular waveguide; lossy dielectric sheet; measured sample; microwave measurement; permeability; permittivity; radar absorbers; radomes; reflection coefficient; resonator method; spectral domain method; waveguide method; Dielectric losses; Dielectric measurements; Flanges; Frequency measurement; Microwave measurements; Permeability; Permittivity measurement; Radar; Reflection; Waveguide discontinuities;
Conference_Titel :
Antennas and Propagation Society International Symposium, 1999. IEEE
Conference_Location :
Orlando, FL, USA
Print_ISBN :
0-7803-5639-x
DOI :
10.1109/APS.1999.789139