• DocumentCode
    343881
  • Title

    Modelling wave propagation in diagonal microstrip lines using enhanced FDTD equations

  • Author

    Foroughipour, M. ; Esselle, K.P.

  • Author_Institution
    Dept. of Electron., Macquarie Univ., North Ryde, NSW, Australia
  • Volume
    2
  • fYear
    1999
  • fDate
    11-16 July 1999
  • Firstpage
    1070
  • Abstract
    Wave propagation in microstrip lines not parallel to the FDTD grid is modelled accurately using enhanced FDTD equations for sharp diagonal edges. It is assumed that the metal strip is infinitely thin, and its edges are diagonal to FDTD cell faces. A microstrip line, at 60/spl deg/ from the grid, is analysed using enhanced equations, and the phase constant and the effective dielectric constant are computed over a wide range of frequencies. The same diagonal microstrip line is analysed using standard staircase and split-cell models. It is found that only the enhanced-equations technique generates accurate results when the grid is very coarse. For example, the error in the computed effective dielectric constant of a microstrip line at 40 GHz is 0.8%, 6.1% and 12.8%, using enhanced, split-cell and staircase techniques, respectively. The enhanced equations are found to be stable even when the time step is set to the maximum limit.
  • Keywords
    finite difference time-domain analysis; microstrip lines; microwave propagation; millimetre wave propagation; permittivity; waveguide theory; 20 to 40 GHz; diagonal microstrip lines; effective dielectric constant; enhanced FDTD equations; enhanced equations; enhanced-equations technique; metal strip; phase constant; sharp diagonal edges; split-cell models; staircase models; time step; wave propagation; Dielectric constant; Electromagnetic fields; Equations; Finite difference methods; Frequency; Grid computing; Mesh generation; Microstrip; Strips; Time domain analysis;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Antennas and Propagation Society International Symposium, 1999. IEEE
  • Conference_Location
    Orlando, FL, USA
  • Print_ISBN
    0-7803-5639-x
  • Type

    conf

  • DOI
    10.1109/APS.1999.789498
  • Filename
    789498