• DocumentCode
    3439206
  • Title

    Design optimization of N-LDMOS transistor arrays for hot carrier lifetime enhancement

  • Author

    Brisbin, Douglas ; Strachan, Andy ; Chaparala, Prasad

  • Author_Institution
    Nat. Semicond. Corp., Santa Clara, CA, USA
  • fYear
    2003
  • fDate
    30 March-4 April 2003
  • Firstpage
    608
  • Lastpage
    609
  • Abstract
    Today´s power management devices often require operation in the 20-30 V range. These applications combine a high performance BiCMOS process with a power lateral n-channel DMOS (N-LDMOS) driver. To obtain high drive currents and low on-resistance, LDMOS devices are often implemented in transistor arrays. Because of the high voltages and currents applied to these arrays, hot carrier (HC) degradation is a real reliability concern. This paper differs from previous work in that it discusses for the first time one- and two-dimensional aspects of LDMOS transistor array layout on HC performance and introduces a novel LDMOS transistor layout featuring a drain ring that substantially improves the array´s HC performance.
  • Keywords
    arrays; hot carriers; life testing; power MOSFET; semiconductor device reliability; LDMOS transistor array layout; N-LDMOS transistor arrays; design optimization; drain ring; high drive currents; high performance BiCMOS process; hot carrier degradation; hot carrier lifetime enhancement; hot carrier performance; low on-resistance; one-dimensional aspects; power lateral n-channel DMOS driver; power management devices; reliability concern; two-dimensional aspects; BiCMOS integrated circuits; Degradation; Design optimization; Displays; Driver circuits; Energy management; Hot carriers; MOS devices; Stress; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium Proceedings, 2003. 41st Annual. 2003 IEEE International
  • Print_ISBN
    0-7803-7649-8
  • Type

    conf

  • DOI
    10.1109/RELPHY.2003.1197829
  • Filename
    1197829