DocumentCode
3439206
Title
Design optimization of N-LDMOS transistor arrays for hot carrier lifetime enhancement
Author
Brisbin, Douglas ; Strachan, Andy ; Chaparala, Prasad
Author_Institution
Nat. Semicond. Corp., Santa Clara, CA, USA
fYear
2003
fDate
30 March-4 April 2003
Firstpage
608
Lastpage
609
Abstract
Today´s power management devices often require operation in the 20-30 V range. These applications combine a high performance BiCMOS process with a power lateral n-channel DMOS (N-LDMOS) driver. To obtain high drive currents and low on-resistance, LDMOS devices are often implemented in transistor arrays. Because of the high voltages and currents applied to these arrays, hot carrier (HC) degradation is a real reliability concern. This paper differs from previous work in that it discusses for the first time one- and two-dimensional aspects of LDMOS transistor array layout on HC performance and introduces a novel LDMOS transistor layout featuring a drain ring that substantially improves the array´s HC performance.
Keywords
arrays; hot carriers; life testing; power MOSFET; semiconductor device reliability; LDMOS transistor array layout; N-LDMOS transistor arrays; design optimization; drain ring; high drive currents; high performance BiCMOS process; hot carrier degradation; hot carrier lifetime enhancement; hot carrier performance; low on-resistance; one-dimensional aspects; power lateral n-channel DMOS driver; power management devices; reliability concern; two-dimensional aspects; BiCMOS integrated circuits; Degradation; Design optimization; Displays; Driver circuits; Energy management; Hot carriers; MOS devices; Stress; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium Proceedings, 2003. 41st Annual. 2003 IEEE International
Print_ISBN
0-7803-7649-8
Type
conf
DOI
10.1109/RELPHY.2003.1197829
Filename
1197829
Link To Document