Title :
SUZANA: a 3D CAD tool for anisotropically etched silicon microstructures
Author :
Büttgenbach, S. ; Than, O.
Author_Institution :
Inst. for Microtechnol., Tech. Univ. Braunschweig, Germany
Abstract :
This paper reports on a workstation-based simulation module for silicon anisotropic etching using a cellular automata model. Starting from 2D mask data, the program delivers a 3D solid geometric model of the etched structure, which can be transferred to other modeling tools like FEM. The capabilities of the CAD tool are demonstrated by comparing simulation results to realized microstructures
Keywords :
CAD; cellular automata; digital simulation; electronic engineering computing; etching; micromechanical devices; semiconductor process modelling; silicon; solid modelling; 2D mask data; 3D CAD tool; 3D solid geometric model; SUZANA; Si; Si microstructures; anisotropically etched microstructures; cellular automata model; workstation-based simulation module; Anisotropic magnetoresistance; Chemicals; Circuit simulation; Design automation; Etching; Microstructure; Semiconductor device modeling; Shape; Silicon; Solid modeling;
Conference_Titel :
European Design and Test Conference, 1996. ED&TC 96. Proceedings
Conference_Location :
Paris
Print_ISBN :
0-8186-7424-5
DOI :
10.1109/EDTC.1996.494340
