DocumentCode
3441712
Title
SUZANA: a 3D CAD tool for anisotropically etched silicon microstructures
Author
Büttgenbach, S. ; Than, O.
Author_Institution
Inst. for Microtechnol., Tech. Univ. Braunschweig, Germany
fYear
1996
fDate
11-14 Mar 1996
Firstpage
454
Lastpage
458
Abstract
This paper reports on a workstation-based simulation module for silicon anisotropic etching using a cellular automata model. Starting from 2D mask data, the program delivers a 3D solid geometric model of the etched structure, which can be transferred to other modeling tools like FEM. The capabilities of the CAD tool are demonstrated by comparing simulation results to realized microstructures
Keywords
CAD; cellular automata; digital simulation; electronic engineering computing; etching; micromechanical devices; semiconductor process modelling; silicon; solid modelling; 2D mask data; 3D CAD tool; 3D solid geometric model; SUZANA; Si; Si microstructures; anisotropically etched microstructures; cellular automata model; workstation-based simulation module; Anisotropic magnetoresistance; Chemicals; Circuit simulation; Design automation; Etching; Microstructure; Semiconductor device modeling; Shape; Silicon; Solid modeling;
fLanguage
English
Publisher
ieee
Conference_Titel
European Design and Test Conference, 1996. ED&TC 96. Proceedings
Conference_Location
Paris
ISSN
1066-1409
Print_ISBN
0-8186-7424-5
Type
conf
DOI
10.1109/EDTC.1996.494340
Filename
494340
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