• DocumentCode
    3444079
  • Title

    Fluctuation limits & scaling opportunities for CMOS SRAM cells

  • Author

    Bhavnagarwala, Azeez ; Kosonocky, Stephen ; Radens, Carl ; Stawiasz, Kevin ; Mann, Randy ; Ye, Qiuyi ; Chin, Ken

  • Author_Institution
    IBM TJ Watson Res. Center, Yorktown Heights, NY
  • fYear
    2005
  • fDate
    5-5 Dec. 2005
  • Firstpage
    659
  • Lastpage
    662
  • Abstract
    Fundamental limitations on scaling CMOS SRAM cell transistor dimensions and operating voltages are demonstrated by measuring the local stochastic distributions of read, write and retention DC margins of 65nm PDSOI CMOS SRAM cells. DC measurements show, for the first time, the write operation to be more fluctuation limited. Measurements also reveal fundamental insights into terminal voltage dependencies of the fluctuations of cell storage node voltages - observations that are engaged to increase cell immunity to fluctuations by several orders of magnitude by biasing the cell terminal voltages appropriately
  • Keywords
    CMOS memory circuits; SRAM chips; silicon-on-insulator; stochastic processes; 65 nm; DC margins; DC measurements; PDSOI CMOS SRAM cells; data retention; fluctuation limits; local stochastic distributions; node voltages; read operation; write operation; CMOS technology; Fluctuations; Geometry; Grain size; Power measurement; Random access memory; Stochastic processes; Thickness measurement; Threshold voltage; Time measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 2005. IEDM Technical Digest. IEEE International
  • Conference_Location
    Washington, DC
  • Print_ISBN
    0-7803-9268-X
  • Type

    conf

  • DOI
    10.1109/IEDM.2005.1609437
  • Filename
    1609437