Structural changes in silica glass after waveguide writing with femtosecond laser pulses

Author

Chan, J.W. ; Huser, T.R. ; Risbud, S.H. ; Krol, D.M.

fYear

2001

fDate

11-11 May 2001

Firstpage

173

Lastpage

174

Abstract

Summary form only given. We have written waveguides as long as 1 cm in silica glasses by tightly focusing femtosecond laser pulses from a regeneratively amplified Ti:sapphire laser (125 fs, 800 nm, 1 kHz) using a microscope objective and translating the glass parallel to the laser beam. For our experiments laser pulse energies range from 0.5-3 /spl mu/J and scan speeds from 10-100 /spl mu/m/s. Smooth lines are clearly visible under an optical microscope, indicating a locally altered index of refraction. The waveguides were analyzed by inspection of their near- and far-field mode profiles.

Keywords

Raman spectra; colour centres; glass structure; laser beam effects; melting; optical fabrication; optical glass; optical microscopy; optical saturable absorption; optical waveguides; silicon compounds; 800 nm; Raman spectra; SiO/sub 2/; broad fluorescence; color center formation; far field mode profiles; fast quenching; femtosecond laser pulses; fictive temperature; localized melting; locally altered refraction index; near-field mode profiles; photobleaching processes; regeneratively amplified laser; silica glasses; smooth lines; structural changes; waveguide writing; Glass; Laser modes; Optical pulses; Optical waveguides; Pulse amplifiers; Silicon compounds; Ultrafast optics; Waveguide lasers; Waveguide transitions; Writing;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics, 2001. CLEO '01. Technical Digest. Summaries of papers presented at the Conference on

Conference_Location

Baltimore, MD, USA

Print_ISBN

1-55752-662-1

Type

conf

DOI

10.1109/CLEO.2001.947671

Filename

947671