Large scale microdischarge arrays: fabrication and characterization

Summary form only given. Microdischarges exhibit several novel characteristics and, specifically, with respect to power loading and operational pressures. The feasibility of fabricating microdischarge device in Si was first reported in 1997 and the operation of small (5) arrays of devices having planar cathodes was demonstrated in 1998. Intense emission was observed from these arrays but exploiting the capability and versatility of semiconductor microfabrication techniques to produce sub-100 /spl mu/m devices is essential if the potential of microdischarge devices is to be realized. Microdischarge devices and arrays having inverted square pyramidal cathodes are described. The integration of these new photonic devices into Si is attractive for several applications, including displays, chemical sensors and frequency standards.