DocumentCode
3448406
Title
Development of APCVD process for high quality TCO
Author
Van Deelen, Joop ; Van Mol, Ton ; Poodt, Paul ; Grob, Frank ; Spee, Karel
Author_Institution
TNO Sci. & Ind., Eindhoven, Netherlands
fYear
2009
fDate
7-12 June 2009
Abstract
For the past decade TNO has been involved in the research and development of atmospheric pressure CVD (APCVD) and plasma enhanced CVD (PECVD) processes for deposition of transparent conductive oxides (TCO), such as tin oxide and zinc oxide. The use of atmospheric deposition processes allows for large scale roll to roll manufacturing, and is therefore expected to provide a breakthrough for lowering the price of thin film PV modules.
Keywords
II-VI semiconductors; plasma CVD; semiconductor growth; semiconductor thin films; tin compounds; wide band gap semiconductors; zinc compounds; SnO2; TCO; ZnO; atmospheric pressure CVD; plasma enhanced CVD; thin film PV modules; transparent conductive oxides; Conductive films; Conductivity; Glass; Inductors; Large-scale systems; Photovoltaic cells; Plasma applications; Research and development; Sputtering; Tin;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference (PVSC), 2009 34th IEEE
Conference_Location
Philadelphia, PA
ISSN
0160-8371
Print_ISBN
978-1-4244-2949-3
Electronic_ISBN
0160-8371
Type
conf
DOI
10.1109/PVSC.2009.5411680
Filename
5411680
Link To Document