Fabrication of nanostructures with interferometric lithography

Summary form only given. Nanostructures, features with characteristic dimensions between 1- and 100-nm, are the focus of much current attention as a result of the unique physical properties offered in this mesoscopic regime. As semiconductor-processing technology has matured, the ability to create small structures has improved. Traditional nanostructure fabrication involves serial processing, e.g. e-beam lithography. For many applications, such as heterostructure crystal growth, a large-area parallel processing capability is vital. One optical lithography technique, interferometric lithography (IL), is a powerful technique for making nanostructures, providing an inexpensive method to generate nano-scale features over large areas.