Fast nano-scale texturing using the self-assembly polymer mask and wet chemical etching

An efficient suppression of reflection in a broad spectral range can be achieved when the textured scale is comparable to the wavelength of incident light. The nano-scale texturing method is, therefore, attracting many interests in many fields. In this study, a fast nano-scale texturing method for the crystalline silicon substrate has been provided. By using the self-assembly polymer mask and wet chemical etching, an almost uniform low reflectance can be achieved. The self-assembly polymer mask was fabricated by coating the pre-prepared polymer solution onto silicon substrate followed by suitable heat treatment. In addition to being technologically easy, the process is also inexpensive.