• DocumentCode
    3449876
  • Title

    Ferroelectric copolymer P(VDF-TrFE) as gate dielectric in organic field effect transistors for memory application devices

  • Author

    Nguyen, A.C. ; Lee, P.S.

  • Author_Institution
    School of Materials Science and Engineering, Nanyang Technological University, Singapore, Phone: 65-67906161; fax: 65-67909801; e-mail: acnguyen@pmail.ntu.edu.sg
  • fYear
    2006
  • fDate
    10-13 Jan. 2006
  • Firstpage
    179
  • Lastpage
    182
  • Abstract
    Fabrication of ferroelectric memory field effect transistor (FEMFET) is presented with copolymer P(VDF-TrFE) as gate dielectric. Spin-coated copolymer film has semi-crystalline structure after annealing, in which the crystallites contains ferroelectric and paraelectric phase. Dipolar alignment in ferroelectric phase is controlled with the sweeping of transistor gate bias. Ferroelectric remanent polarization enables current retention in the transistor during OFF state that can be used in non-volatile memory application.
  • Keywords
    FEMFET; P(VDF-TRFE); ferroelectric polymer; Annealing; Crystallization; Dielectric devices; FETs; Fabrication; Ferroelectric films; Ferroelectric materials; Nonvolatile memory; OFETs; Polarization; FEMFET; P(VDF-TRFE); ferroelectric polymer;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Emerging Technologies - Nanoelectronics, 2006 IEEE Conference on
  • Print_ISBN
    0-7803-9357-0
  • Type

    conf

  • DOI
    10.1109/NANOEL.2006.1609707
  • Filename
    1609707