DocumentCode
3449876
Title
Ferroelectric copolymer P(VDF-TrFE) as gate dielectric in organic field effect transistors for memory application devices
Author
Nguyen, A.C. ; Lee, P.S.
Author_Institution
School of Materials Science and Engineering, Nanyang Technological University, Singapore, Phone: 65-67906161; fax: 65-67909801; e-mail: acnguyen@pmail.ntu.edu.sg
fYear
2006
fDate
10-13 Jan. 2006
Firstpage
179
Lastpage
182
Abstract
Fabrication of ferroelectric memory field effect transistor (FEMFET) is presented with copolymer P(VDF-TrFE) as gate dielectric. Spin-coated copolymer film has semi-crystalline structure after annealing, in which the crystallites contains ferroelectric and paraelectric phase. Dipolar alignment in ferroelectric phase is controlled with the sweeping of transistor gate bias. Ferroelectric remanent polarization enables current retention in the transistor during OFF state that can be used in non-volatile memory application.
Keywords
FEMFET; P(VDF-TRFE); ferroelectric polymer; Annealing; Crystallization; Dielectric devices; FETs; Fabrication; Ferroelectric films; Ferroelectric materials; Nonvolatile memory; OFETs; Polarization; FEMFET; P(VDF-TRFE); ferroelectric polymer;
fLanguage
English
Publisher
ieee
Conference_Titel
Emerging Technologies - Nanoelectronics, 2006 IEEE Conference on
Print_ISBN
0-7803-9357-0
Type
conf
DOI
10.1109/NANOEL.2006.1609707
Filename
1609707
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