• DocumentCode
    3450039
  • Title

    Novel ultralow Ron MBE GaAs MESFET´s for high-frequency high-temperature switched-mode power converter applications

  • Author

    Shenai, K. ; Hodge, D. ; Feuer, M.D. ; Cunningham, J.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Wisconsin Univ., Madison, WI, USA
  • fYear
    1994
  • fDate
    31 May-3 Jun 1994
  • Firstpage
    149
  • Lastpage
    153
  • Abstract
    This paper reports on the theoretical and experimental results of novel ultra-low on-resistance (Ron) GaAs MESFET´s fabricated using Molecular Beam Epitaxy (MBE). Lateral GaAs MESFET´s with drain-source breakdown voltage VDB>30 V and specific on-state resistance Rsp<0.13 mΩ-cm2 were fabricated using novel refractory metal gate and layered ohmic contact technologies in which all GaAs layers were grown using MBE. The measured Ron performance is in good agreement with simple calculations made from device design and doping parameters and represents the highest electrical conductivity obtained for a power semiconductor device in this VDB rating. These devices are useful in developing 5 V power supplies with switching frequencies in excess of 100 MHz for application in the next generation of information processing and computing systems
  • Keywords
    molecular beam epitaxial growth; 100 MHz; 5 V; GaAs; MBE; MESFETs; doping parameters; drain-source breakdown voltage; electrical conductivity; layered ohmic contact technologies; power semiconductor device; power supplies; refractory metal gate; switched-mode power converter; switching frequencies; ultra-low on-resistance; Conductivity measurement; Contact resistance; Electric variables measurement; Electrical resistance measurement; Gallium arsenide; MESFETs; Molecular beam epitaxial growth; Ohmic contacts; Power measurement; Semiconductor device measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Semiconductor Devices and ICs, 1994. ISPSD '94., Proceedings of the 6th International Symposium on
  • Conference_Location
    Davos
  • ISSN
    1063-6854
  • Print_ISBN
    0-7803-1494-8
  • Type

    conf

  • DOI
    10.1109/ISPSD.1994.583684
  • Filename
    583684