DocumentCode
3450422
Title
Position and Size-Controlled Photosynthesis of Silicon Nanocrystals in SiO2 Films
Author
Chen, C.Y. ; Kimura, S. ; Sen, S. ; Nozaki, S. ; Ono, H. ; Uchida, K. ; Morisaki, H.
Author_Institution
The 21st Century COE Program: Coherent Optical Science, The University of Electro-Communications, Chofu-Shi, Tokyo 182-8585, Japan
fYear
2006
fDate
10-13 Jan. 2006
Firstpage
289
Lastpage
292
Abstract
The SiOx thin film made of the SiOx nanoparticles (~40, gm) shows a strong reaction to laser irradiation. The photosynthesis of silicon (Si) nanocrystals (NC´s) is found to be self-limited to the laser power and exposure time. Furthermore, the laser irradiation of the SiOx film not only produces Si NC´s, also transforms the SiOx film from the powder-like to the continuous. The photosynthesis of Si NC´s has several advantages such as low-temperature process and good control in the size and positioning over the conventional synthesis methods and has many potential applications.
Keywords
Chemical lasers; Infrared spectra; Laser theory; Nanocrystals; Nanoparticles; Optical films; Power lasers; Semiconductor films; Semiconductor thin films; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Emerging Technologies - Nanoelectronics, 2006 IEEE Conference on
Print_ISBN
0-7803-9357-0
Type
conf
DOI
10.1109/NANOEL.2006.1609731
Filename
1609731
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