DocumentCode :
3450875
Title :
The analysis on the diffusion effects of R & D based-on CH model
Author :
Tianhao Wu ; Jiangshan Bao
Author_Institution :
Econ. & Manage. Sch., Beijing Univ. of Technol., Beijing, China
Volume :
2
fYear :
2011
fDate :
20-22 Aug. 2011
Firstpage :
444
Lastpage :
447
Abstract :
R & D diffusion is the basis and prerequisite for the diffusion of technological innovation, especially the R & D diffusion effect of center city in science and technology plays an important role on the technological progress of surrounding region. This paper describes the systems theory of R & D diffusion and conducts both qualitative and quantitative analysis upon evaluation variables influencing of R & D diffusion capacity. Also from both domestic and foreign point of view, citing Beijing as an example, this paper conducts an empirical research on the diffusion effects of R & D applying the extended CH model. The results showed that there is a lag of domestic R & D input and diffusion effects brought by foreign R & D diffusion effects of FDI, and the diffusion effects of FD I will inhibit the domestic technology innovation and diffusion to some extent.
Keywords :
innovation management; international finance; investment; FDI; R and D based-on CH model; R and D input; center city; diffusion capacity; diffusion effect; domestic point; domestic technology innovation; extended CH model; foreign point; qualitative analysis; quantitative analysis; system theory; technological innovation; technological progress; Economics; Equations; Mathematical model; Patents; Productivity; Technological innovation; CH model; R & D; diffusion effects; knowledge diffusion;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Information Technology and Artificial Intelligence Conference (ITAIC), 2011 6th IEEE Joint International
Conference_Location :
Chongqing
Print_ISBN :
978-1-4244-8622-9
Type :
conf
DOI :
10.1109/ITAIC.2011.6030369
Filename :
6030369
Link To Document :
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