Micro-transformer devices using thin-film electroplated deposition

Author

Lotfi, Ashraf ; van Dover, R.Bruce ; Schneemeyer, Lynn ; Steigerwald, Michael

Author_Institution

Lucent Technol., AT&T Bell Labs., Murray Hill, NJ, USA

Volume

2

fYear

1998

fDate

17-22 May 1998

Firstpage

1511

Abstract

The authors report their results of fabricating micro-magnetic devices using their 20 μm photolithographic process. In this technique, magnetic devices in silicon ICs use magnetic thin-films deposited by electroplating. The magnetic and electrical characteristics of fabricated micro-transformers are measured and reported. Tests show proper operation over high-voltage isolation boundaries. Future uses for these devices will be in micro-power converters for mobile applications

Keywords

electroplating; magnetic devices; photolithography; power convertors; power integrated circuits; thin film circuits; transformers; 20 mum; Si; electrical characteristics; electroplating; high-voltage isolation boundaries; magnetic characteristics; magnetic thin-films; micro-magnetic devices; micro-power converters; micro-transformers; mobile applications; photolithographic fabrication process; silicon ICs; Fabrication; Inductance; Magnetic cores; Magnetic devices; Polyimides; Silicon; Sputtering; Substrates; Thin film devices; Toroidal magnetic fields;

fLanguage

English

Publisher

ieee

Conference_Titel

Power Electronics Specialists Conference, 1998. PESC 98 Record. 29th Annual IEEE

Conference_Location

Fukuoka

ISSN

0275-9306

Print_ISBN

0-7803-4489-8

Type

conf

DOI

10.1109/PESC.1998.703269

Filename

703269