DocumentCode
3451888
Title
Development of amorphous polyphenol resists with low molecular weight and narrow dispersion for EB lithography
Author
Hirayama, Takatsugu ; Shiono, Daiju ; Matsumaru, Shogo ; Ogata, Toshiyuki ; Hada, Hideo ; Onodera, Junichi ; Arai, Tadashi ; Sakamizu, Toshio ; Yamaguchi, Atsuko ; Shirai, Hiroshi ; Fukuda, Hiroshi ; Ueda, Mitsuru
fYear
2004
fDate
Oct. 27-29, 2004
Firstpage
10
Lastpage
11
Keywords
Amorphous semiconductors; Circuits; Large scale integration; Lithography; Organic materials; Polymers; Protection; Resists; Rough surfaces; Surface roughness;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN
4-99024720-5
Type
conf
DOI
10.1109/IMNC.2004.245696
Filename
1459446
Link To Document