DocumentCode
3451934
Title
Euv system optimization and advanced lithography research at Lawrence Berkeley National Laboratory
Author
Goldberg, Kenneth A. ; Naulleau, Patrick P. ; Denham, Paul E. ; Rekawa, Senajith B. ; Jackson, Keith H. ; Anderson, Erik H. ; Liddle, J.Alexander
fYear
2004
fDate
Oct. 27-29, 2004
Firstpage
14
Lastpage
15
Keywords
Focusing; Interferometric lithography; Laboratories; Lighting; Optical feedback; Optical interferometry; Printing; Resists; System testing; Ultraviolet sources;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN
4-99024720-5
Type
conf
DOI
10.1109/IMNC.2004.245698
Filename
1459448
Link To Document