• DocumentCode
    3451962
  • Title

    Mask pattern correction by energy loss compensation in extreme ultraviolet lithography

  • Author

    Sugawara, Minoru ; Nishiyama, Iwao ; Takai, Mikio

  • fYear
    2004
  • fDate
    Oct. 27-29, 2004
  • Firstpage
    16
  • Lastpage
    17
  • Keywords
    Degradation; Diffraction; Energy loss; Laboratories; Lithography; Materials science and technology; Optical films; Optical reflection; Research and development; Ultraviolet sources;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
  • Print_ISBN
    4-99024720-5
  • Type

    conf

  • DOI
    10.1109/IMNC.2004.245699
  • Filename
    1459449
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3451962