Title :
Particle adhesion and removal on EUV mask layers during wet cleaning
Author :
Lee, Sang-Ho ; Park, Jin-Goo ; Busn, A.A.
Keywords :
Adhesives; Buffer layers; Chemical technology; Chromium; Cleaning; Electrostatics; Force measurement; Lithography; Silicon compounds; Surface contamination;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
DOI :
10.1109/IMNC.2004.245700
