DocumentCode :
3452024
Title :
Actinic mask inspection using EUV microscope
Author :
Harnamoto, K. ; Tanaka, Yuzuru ; Kawashima, Hirotake ; Lee, Seung Yoon ; Hosokawa, Nobuyuki ; Sakaya, Noriyuki ; Hosoya, Morio ; Shoki, Tsutomu ; Watanabe, Takeo ; Kinoshita, Hiroo
fYear :
2004
fDate :
Oct. 27-29, 2004
Firstpage :
20
Lastpage :
21
Keywords :
Inspection; Laboratories; Lithography; Mirrors; Nonhomogeneous media; Optical films; Optical interferometry; Optical microscopy; Transistors; Ultraviolet sources;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
Type :
conf
DOI :
10.1109/IMNC.2004.245701
Filename :
1459451
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3452024
