• DocumentCode
    3452158
  • Title

    Intrinsic problem affecting contact hole resolution in hyper NA era

  • Author

    Matsuura, Seiji ; Kurose, Eiji ; Fuji, Kiyoshi

  • fYear
    2004
  • fDate
    Oct. 27-29, 2004
  • Firstpage
    36
  • Lastpage
    37
  • Keywords
    Apertures; Interferometric lithography; Lead compounds; Lighting; Open wireless architecture; Optical control; Optical interferometry; Optical polarization; Space technology; Ultraviolet sources;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
  • Print_ISBN
    4-99024720-5
  • Type

    conf

  • DOI
    10.1109/IMNC.2004.245709
  • Filename
    1459459