• DocumentCode
    3452196
  • Title

    Mechanisms of ionizing-radiation-induced degradation in modern bipolar devices

  • Author

    Nowlin, R.N. ; Schrimpf, R.D. ; Enlow, E.W. ; Combs, W.E. ; Pease, R.L.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Arizona Univ., Tucson, AZ, USA
  • fYear
    1991
  • fDate
    9-10 Sep 1991
  • Firstpage
    174
  • Lastpage
    177
  • Abstract
    The perimeter dependence of ionizing-radiation-induced increases in base current in both poly-emitter and crystalline-emitter devices is examined. The increase in base current occurs at the surface near the emitter-base junction. In the poly-emitter devices, the increase in base current is due to a buildup of interface states. In the crystalline-emitter devices, the increase in base current is caused by both an increase in the interface-trap density and a spread in the field-induced depletion layer. The perimeter dependence is shown to be similar to that caused by electron-beam damage and hot-carrier stressing
  • Keywords
    bipolar transistors; radiation effects; Si; bipolar devices; buildup of interface states; crystalline Si; crystalline-emitter devices; device physics; emitter-base junction; field-induced depletion layer; increase in base current; interface-trap density; ionizing-radiation-induced degradation; perimeter dependence; poly-emitter devices; polycrystalline Si; polysilicon; Bipolar transistors; Cranes; Crystallization; Degradation; Geometry; Hot carriers; Interface states; Ionizing radiation; Modems; Weapons;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Bipolar Circuits and Technology Meeting, 1991., Proceedings of the 1991
  • Conference_Location
    Minneapolis, MN
  • Print_ISBN
    0-7803-0103-X
  • Type

    conf

  • DOI
    10.1109/BIPOL.1991.160982
  • Filename
    160982