DocumentCode :
3452202
Title :
Potential issues on optical proximity correction (OPQ) using double dipole lithography
Author :
Chiou, Tsann-Bim ; Hsu, Stephen ; Eurlings, Mark ; Hendrickx, Eric ; Chen, Alek
fYear :
2004
fDate :
Oct. 27-29, 2004
Firstpage :
38
Lastpage :
39
Keywords :
Asia; Cities and towns; Lighting; Lithography; Logic design; Logic devices; Optical filters; Optical imaging; Paper technology; Telephony;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
Type :
conf
DOI :
10.1109/IMNC.2004.245710
Filename :
1459460
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3452202
