• DocumentCode
    3452387
  • Title

    Impact of the tunnel etching process on electrical performances of SON devices.

  • Author

    Borel, S. ; Arvei, C. ; Bilde, J. ; Caubet, V. ; Chanemougame, D. ; Monfray, S. ; Ranica, R. ; Skotnick, T.

  • fYear
    2004
  • fDate
    Oct. 27-29, 2004
  • Firstpage
    50
  • Lastpage
    51
  • Keywords
    CMOS process; Dry etching; Electronic mail; Germanium silicon alloys; Manufacturing; Plasma measurements; Process control; Semiconductor films; Silicon germanium; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
  • Print_ISBN
    4-99024720-5
  • Type

    conf

  • DOI
    10.1109/IMNC.2004.245716
  • Filename
    1459466