The impact of step and flash imprint lithography for nano-manufacturing applications

Summary form only given, as follows. Step and Flash Imprint Lithography (S-FILTM) process is a step and repeat nano-replication technique based on UV curable low viscosity liquids. Investigation by this group and others has shown that the resolution of replication by imprint lithography is limited only be the size of the structures that can be created on the template (mold). S-FIL uses field-to-field drop dispensing of the W curable liquids for the step and repeat patterning. This approach allows for nanomanufacturing of devices with widely varying pattern densities and complicated structures. There are numerous bio applications for imprint lithography. One of the more interesting is to imprint small posts to manage cell =-growth. Images will be shown of distortion free 100 to 60 nm posts that are replicated by SFIL processing. Process data for repeatability, process control, effects and etch pattern transfer of sub 100 nm posts and other features will also be shown.