DocumentCode
3452938
Title
Effect of interfacial PdNi concentration on time response of Si-based electrodeposited hydrogen sensors
Author
Dong, Lixin ; De Groot, C.H. ; Usgaocar, A. ; Chavagnac, V.
Author_Institution
Electron. & Comput. Sci., Univ. of Southampton, Southampton, UK
fYear
2013
fDate
16-20 June 2013
Firstpage
190
Lastpage
193
Abstract
This paper presents Hydrogen sensors based upon electrodeposited PdNi-Si Schottky barriers which have been fabricated with a gradient structure in the PdNi concentration in a single electrodeposition run through variation of the deposition potential. The resulting sensors in the back to back diode configuration show very low idle leakage current and good sensitivity to hydrogen. The structure with increased Ni concentration at the PdNi-Si interface shows dramatically improved time response as compared to the uniform concentration sample. I-V and C-V characteristics of these hydrogen sensors also depicts in this paper to determine the Schottky barrier height and ideality factor.
Keywords
Schottky barriers; electrodeposition; elemental semiconductors; gas sensors; hydrogen; leakage currents; nickel alloys; palladium alloys; semiconductor-metal boundaries; silicon; C-V characteristics; H; I-V characteristics; PdNi-Si; Schottky barrier height; Si-based electrodeposited hydrogen sensors; electrodeposited PdNi-Si Schottky barriers; gradient structure; hydrogen sensitivity; ideality factor; interfacial PdNi concentration; leakage current; time response; Films; Hydrogen; Nickel; Schottky barriers; Sensor phenomena and characterization; Silicon; Schottky barrier; fast response; low power consumption; variable structures;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Sensors, Actuators and Microsystems (TRANSDUCERS & EUROSENSORS XXVII), 2013 Transducers & Eurosensors XXVII: The 17th International Conference on
Conference_Location
Barcelona
Type
conf
DOI
10.1109/Transducers.2013.6626734
Filename
6626734
Link To Document