DocumentCode
3453095
Title
Highly accurate proximity effect correction for 100 kV electron projection lithography
Author
Koba, Fumihiro ; Yamashita, Hiroshi ; Arimoto, Hiroshi
fYear
2004
fDate
Oct. 27-29, 2004
Firstpage
106
Lastpage
107
Keywords
Absorption; Backscatter; Electrons; Exponential distribution; Lead compounds; Lithography; Page description languages; Proximity effect; Resists; Scattering parameters;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN
4-99024720-5
Type
conf
DOI
10.1109/IMNC.2004.245746
Filename
1459496
Link To Document