Impact of long-period line-edge roughness (LER) on accuracy in critical dimension (CD) measurement and a new guideline for cd metrology

Author

Ywiaguechi, A. ; Fukuda, Hiroh ; Kawada, H. ; Iizura, T.

fYear

2004

fDate

Oct. 27-29, 2004

Firstpage

108

Lastpage

109

Keywords

Area measurement; Erbium; Etching; Guidelines; Length measurement; Lithography; MOSFET circuits; Metrology; Resists; Scanning electron microscopy;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International

Print_ISBN

4-99024720-5

Type

DOI

10.1109/IMNC.2004.245747

Filename

1459497

Link To Document