Title :
Impact of long-period line-edge roughness (LER) on accuracy in critical dimension (CD) measurement and a new guideline for cd metrology
Author :
Ywiaguechi, A. ; Fukuda, Hiroh ; Kawada, H. ; Iizura, T.
Keywords :
Area measurement; Erbium; Etching; Guidelines; Length measurement; Lithography; MOSFET circuits; Metrology; Resists; Scanning electron microscopy;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
DOI :
10.1109/IMNC.2004.245747
