• DocumentCode
    3453124
  • Title

    Enhancement and Depletion-mode GaAs N-MOSFETs with stacked HfO2/Y2O3 gate dielectric

  • Author

    Zhu, F. ; Koveshnikov, S. ; Ok, I. ; Kim, H.S. ; Tokranov, V. ; Yakimov, M. ; Oktyabrsky, S. ; Tsai, W. ; Lee, J.C.

  • Author_Institution
    Microelectronics Research Center, University of Texas at Austin, Austin, TX 78758. Phone: 512-471-1627, email: zhufeng@mail.utexas.edu
  • fYear
    2006
  • fDate
    26-28 June 2006
  • Firstpage
    83
  • Lastpage
    84
  • Keywords
    Annealing; Gallium arsenide; Hafnium oxide; High K dielectric materials; High-K gate dielectrics; Interface states; MOSFET circuits; Passivation; Scattering; Transconductance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference, 2006 64th
  • Conference_Location
    State College, PA, USA
  • ISSN
    1548-3770
  • Print_ISBN
    0-7803-9748-7
  • Type

    conf

  • DOI
    10.1109/DRC.2006.305129
  • Filename
    4097546