Dual beam lithography (FIB + EBL) for nanometric structures

Author

Cabrini, Stefano ; Carpentiero, Alessandro ; Businaro, Luca ; Candeloro, Patrizio ; Romanato, Filippo ; Di Fabrizio, Enzo

fYear

2004

fDate

Oct. 27-29, 2004

Firstpage

150

Lastpage

151

Keywords

Data engineering; Electron beams; Ion beams; Lithography; Microelectronics; Milling; Nanostructures; Optical scattering; Slabs; Wires;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International

Print_ISBN

4-99024720-5

Type

DOI

10.1109/IMNC.2004.245768

Filename

1459518

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