• DocumentCode
    3454800
  • Title

    Fabrication of multiply-stacked structures of Si quantum-dots embedded in SiO2 by combination of low-pressure CVD and remote plasma treatments

  • Author

    Makihara, Katsunori ; Nakagawa, Hiroshi ; Ikeda, Mitsuhisa ; Murakami, Hideki ; Higashi, Seiichiro ; Miyazaki, Seiichi

  • fYear
    2004
  • fDate
    Oct. 27-29, 2004
  • Firstpage
    216
  • Lastpage
    217
  • Keywords
    Argon; Fabrication; Hydrogen; Plasma applications; Plasma density; Plasma properties; Plasma temperature; Quantum dots; Surface charging; Surface treatment;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
  • Print_ISBN
    4-99024720-5
  • Type

    conf

  • DOI
    10.1109/IMNC.2004.245803
  • Filename
    1459553
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3454800