DocumentCode
3455469
Title
Excitation of acoustic waves at the interface between lithium niobate and silicon plates
Author
Gachon, Dorian ; Majjad, Hicham ; Daniau, William ; Laude, Vincent ; Ballandras, Sylvain
Author_Institution
UMR CNRS 6174, Besancon
fYear
2007
fDate
May 29 2007-June 1 2007
Firstpage
733
Lastpage
736
Abstract
We discuss the fabrication and characterization of IAW resonators made by indirect bonding of lithium niobate onto silicon. In our fabrication process, IDTs are first patterned over the surface of a Y-cut lithium niobate wafer. A thin layer of SU-8trade photo-resist is then spun over the IDTs and lithium niobate to a final thickness below one micron. The SU-8trade covered lithium niobate wafer is then bonded to a silicon wafer using a wafer bonding machine. Measurements of resonators are presented and compared with theoretical computations based on our periodic finite element/boundary element code allows for explaining the actual operation of the device.
Keywords
acoustic resonators; boundary-elements methods; finite element analysis; lithium compounds; photoresists; silicon; wafer bonding; IAW resonator fabrication; acoustic wave excitation; boundary element code; finite element code; lithium niobate wafer; photo-resist thin layer; silicon plates; wafer bonding machine; Acoustic devices; Acoustic waves; Fabrication; Insulation; Lithium niobate; Piezoelectric transducers; Resists; Silicon; Solids; Wafer bonding;
fLanguage
English
Publisher
ieee
Conference_Titel
Frequency Control Symposium, 2007 Joint with the 21st European Frequency and Time Forum. IEEE International
Conference_Location
Geneva
ISSN
1075-6787
Print_ISBN
978-1-4244-0646-3
Electronic_ISBN
1075-6787
Type
conf
DOI
10.1109/FREQ.2007.4319172
Filename
4319172
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