• DocumentCode
    3455896
  • Title

    MEMS devices and sensors in standard CMOS processing

  • Author

    Montanya i Silvestre, Josep ; Valle Fraga, Juan Jose ; Barrachina Saralegui, Laura ; Fernandez Martinez, Daniel

  • Author_Institution
    Baolab Microsyst. S.L., Terrassa, Spain
  • fYear
    2013
  • fDate
    16-20 June 2013
  • Firstpage
    713
  • Lastpage
    717
  • Abstract
    Despite the usual approach of requiring a specific process and package for each MEMS device, it is possible to use standard CMOS plus a minimal post-processing, doable in any mainstream CMOS fab, to build many different types of MEMS devices and sensors. In addition to the ultra-low cost, high volume manufacturing capability, multiple sourcing and integration with other functions, this approach has the added benefits of smaller size and profile, improved performance and reduced time to market. These advantages come from the availability of many structural layers and several different materials in the process, which gives many additional degrees of freedom to the designer, enabling novel design concepts and new devices.
  • Keywords
    CMOS integrated circuits; microfabrication; microsensors; MEMS device; MEMS sensor; device designer; high volume manufacturing; minimal post processing; multiple sourcing; standard CMOS processing; CMOS integrated circuits; Magnetometers; Materials; Metals; Micromechanical devices; Sensors; Standards; CMOS; MEMS; NEMS; monolithic integration; post-processing; sensors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Sensors, Actuators and Microsystems (TRANSDUCERS & EUROSENSORS XXVII), 2013 Transducers & Eurosensors XXVII: The 17th International Conference on
  • Conference_Location
    Barcelona
  • Type

    conf

  • DOI
    10.1109/Transducers.2013.6626866
  • Filename
    6626866