DocumentCode
3455896
Title
MEMS devices and sensors in standard CMOS processing
Author
Montanya i Silvestre, Josep ; Valle Fraga, Juan Jose ; Barrachina Saralegui, Laura ; Fernandez Martinez, Daniel
Author_Institution
Baolab Microsyst. S.L., Terrassa, Spain
fYear
2013
fDate
16-20 June 2013
Firstpage
713
Lastpage
717
Abstract
Despite the usual approach of requiring a specific process and package for each MEMS device, it is possible to use standard CMOS plus a minimal post-processing, doable in any mainstream CMOS fab, to build many different types of MEMS devices and sensors. In addition to the ultra-low cost, high volume manufacturing capability, multiple sourcing and integration with other functions, this approach has the added benefits of smaller size and profile, improved performance and reduced time to market. These advantages come from the availability of many structural layers and several different materials in the process, which gives many additional degrees of freedom to the designer, enabling novel design concepts and new devices.
Keywords
CMOS integrated circuits; microfabrication; microsensors; MEMS device; MEMS sensor; device designer; high volume manufacturing; minimal post processing; multiple sourcing; standard CMOS processing; CMOS integrated circuits; Magnetometers; Materials; Metals; Micromechanical devices; Sensors; Standards; CMOS; MEMS; NEMS; monolithic integration; post-processing; sensors;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Sensors, Actuators and Microsystems (TRANSDUCERS & EUROSENSORS XXVII), 2013 Transducers & Eurosensors XXVII: The 17th International Conference on
Conference_Location
Barcelona
Type
conf
DOI
10.1109/Transducers.2013.6626866
Filename
6626866
Link To Document