• DocumentCode
    3456243
  • Title

    Fabrication of nanodimensional objects by atomic-force lithography methods

  • Author

    Vostokov, N.V. ; Volgunov, D.G. ; Dryakhlushin, V.F. ; Klimov, A.Yu. ; Rogov, V.V. ; Sukhodoev, L.V. ; Shashkin, V.I.

  • Author_Institution
    Inst. for Phys. of Microstruct., Acad. of Sci., Nizhny Novgorod, Russia
  • fYear
    1999
  • fDate
    13-16 Sept. 1999
  • Firstpage
    3
  • Lastpage
    4
  • Abstract
    An atomic-force lithography method yielding individual elements of <100 nm size has been developed. It involves deformation of the masking layer with an atomic-force microscope probe, followed by plasma-chemical etching and deposition of metal contacts through the mask.
  • Keywords
    atomic force microscopy; lithography; masks; nanotechnology; sputter etching; atomic-force lithography methods; atomic-force microscope probe; masking layer; metal contact deposition; nanodimensional objects; plasma-chemical etching; Atomic force microscopy; Atomic layer deposition; Fabrication; Lithography; Physics; Plasma applications; Probes; Semiconductor films; Silicon; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Conference, 1999. Microwave &amp; Telecommunication Technology. 1999 9th International Crimean [In Russian with English abstracts]
  • Conference_Location
    Sevastopol, Crimea, Ukraine
  • Print_ISBN
    966-572-003-1
  • Type

    conf

  • DOI
    10.1109/CRMICO.1999.815128
  • Filename
    815128
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3456243