DocumentCode :
3456263
Title :
Proposal of an analysis model of resist edge roughness caused by polymer-aggregate detachment in electron beam lithography
Author :
Niu, H. ; Hosokawa, T. ; Kusano, Y. ; Kotera, M.
fYear :
2004
fDate :
Oct. 27-29, 2004
Firstpage :
316
Lastpage :
317
Keywords :
Electron beams; Electronic mail; Information analysis; Lithography; Polymers; Power engineering and energy; Proposals; Resists; Rough surfaces; Surface roughness;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
Type :
conf
DOI :
10.1109/IMNC.2004.245670
Filename :
1459604
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3456263
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