DocumentCode
3459311
Title
Dual-beam, six-terminal nanoelectromechanical relays
Author
Harrison, K.L. ; Lee, Woo Seung ; Shavezipur, K. ; Provine, J. ; Mitra, Subhasish ; Wong, H.-S Philip ; Howe, R.T.
Author_Institution
Dept. of Electr. Eng., Stanford Univ., Stanford, CA, USA
fYear
2013
fDate
16-20 June 2013
Firstpage
1436
Lastpage
1439
Abstract
A novel design for a six-terminal nanoelectromechanical relay is presented. The design includes a secondary beam in the signal pathway of the device, which allows direct contact between the source and drain. The advantages of the new design include avoidance of fabrication-based contact degradation during the isolation etch, lower sensitivity to high gap variations and reduction in the number of contacts needed to close the signal pathway. Also, the new design introduces a novel anti-stiction mechanism. An analytical model is presented which compares the mechanical behavior of the new design to the older design. The devices are fabricated using a silicon nitride hard mask with an ammonium hydroxide based etchant. An inverter made using the new design is demonstrated.
Keywords
etching; invertors; masks; mechanical contact; nanocontacts; nanoelectromechanical devices; nanofabrication; organic compounds; relays; ammonium hydroxide; antistiction mechanism; drain contact; dual-beam six-terminal nanoelectromechanical relay; etchant; fabrication-based contact degradation; inverter; isolation etching; signal pathway; silicon nitride hard mask; source contact; Contacts; Electrodes; Force; Inverters; Logic gates; Relays; Testing; nanoelectromechanical; relay; titanium nitride;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Sensors, Actuators and Microsystems (TRANSDUCERS & EUROSENSORS XXVII), 2013 Transducers & Eurosensors XXVII: The 17th International Conference on
Conference_Location
Barcelona
Type
conf
DOI
10.1109/Transducers.2013.6627049
Filename
6627049
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