• DocumentCode
    3460028
  • Title

    Using IDDQ drift testing to detect hydrogen in MOS devices

  • Author

    Sabin, Edwin ; Nagalingam, Samuel ; Lemke, Steve

  • Author_Institution
    Silicon Syst., Santa Cruz, CA, USA
  • fYear
    1997
  • fDate
    8-10 Apr 1997
  • Firstpage
    57
  • Lastpage
    65
  • Abstract
    This paper will show how IDDQ drift testing was used to detect hydrogen in BiCMOS IC´s. The paper will provide mobile ion testing results, using several methods, to show that there were very few mobile ions in the IC´s to account for the drift. The paper will then show wafer level reliability (WLR) test data to support the conclusion that hydrogen is in the IC. IDDQ drift testing will show that sodium is not the cause of the drift but the drift is due to hydrogen. The paper will than present a model of how hydrogen causes IDDQ drift. The model is based upon the hydrogen compensation of boron. IDDQ drift testing will then be used to evaluate an experiment involving different forming gas alloy times and temperatures. The IDDQ drift test results of this experiment show that as the alloy time and temperature are increased the incorporation of hydrogen in the IC is increased
  • Keywords
    BiCMOS integrated circuits; hydrogen; integrated circuit reliability; integrated circuit testing; BiCMOS IC; H; IDDQ drift testing; MOS device; hydrogen detection; mobile ion testing; wafer level reliability; Capacitors; Dielectrics; Hydrogen; MOS devices; Performance evaluation; Plasma displays; Plasma measurements; Plasma temperature; Testing; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium, 1997. 35th Annual Proceedings., IEEE International
  • Conference_Location
    Denver, CO
  • Print_ISBN
    0-7803-3575-9
  • Type

    conf

  • DOI
    10.1109/RELPHY.1997.584237
  • Filename
    584237