DocumentCode :
3460028
Title :
Using IDDQ drift testing to detect hydrogen in MOS devices
Author :
Sabin, Edwin ; Nagalingam, Samuel ; Lemke, Steve
Author_Institution :
Silicon Syst., Santa Cruz, CA, USA
fYear :
1997
fDate :
8-10 Apr 1997
Firstpage :
57
Lastpage :
65
Abstract :
This paper will show how IDDQ drift testing was used to detect hydrogen in BiCMOS IC´s. The paper will provide mobile ion testing results, using several methods, to show that there were very few mobile ions in the IC´s to account for the drift. The paper will then show wafer level reliability (WLR) test data to support the conclusion that hydrogen is in the IC. IDDQ drift testing will show that sodium is not the cause of the drift but the drift is due to hydrogen. The paper will than present a model of how hydrogen causes IDDQ drift. The model is based upon the hydrogen compensation of boron. IDDQ drift testing will then be used to evaluate an experiment involving different forming gas alloy times and temperatures. The IDDQ drift test results of this experiment show that as the alloy time and temperature are increased the incorporation of hydrogen in the IC is increased
Keywords :
BiCMOS integrated circuits; hydrogen; integrated circuit reliability; integrated circuit testing; BiCMOS IC; H; IDDQ drift testing; MOS device; hydrogen detection; mobile ion testing; wafer level reliability; Capacitors; Dielectrics; Hydrogen; MOS devices; Performance evaluation; Plasma displays; Plasma measurements; Plasma temperature; Testing; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium, 1997. 35th Annual Proceedings., IEEE International
Conference_Location :
Denver, CO
Print_ISBN :
0-7803-3575-9
Type :
conf
DOI :
10.1109/RELPHY.1997.584237
Filename :
584237
Link To Document :
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